Semiconductor Engineering

Make The Impossible Possible: Use Variable-Shaped Beam Mask Writers And Curvilinear Full-Chip Inverse Lithography Technology For 193i Contacts/Vias With Mask-Wafer Co-Optimization

“Full-chip curvilinear inverse lithography technology (ILT) requires mask writers to write full reticle curvilinear mask patterns in a reasonable write time. We jointly study and present the benefits ...
Nature

Computational Lithography and Mask Optimization Techniques

Computational lithography and mask optimization techniques are at the forefront of enabling the semiconductor industry's continued miniaturisation of integrated circuits. This field encompasses ...
Dataquest

EUV mask blanks market size to reach USD 1.36bn by 2031, driven by advanced semiconductor lithography

The global market for EUV mask blanks was valued at USD 591 million in 2024, and is projected to reach a revised size of USD 1,360 million by 2031, growing at a CAGR of 12.2% during the forecast ...
PC Gamer

Today I learned that the curvy lithography masks used by TSMC to make next-gen GPUs are 'alien', 'psychedelic' and look nothing like chip circuits

Computer chips are undoubtedly one the great wonders of the modern world, incredible feats of engineering. And just when you thought they couldn't get any more complex and intriguing, here comes ...
Electronic Design

KLA-Tencor debuts systems for patterning control

August 26, 2014. Today, KLA-Tencor Corp. introduced the WaferSight PWG patterned wafer geometry measurement system, the LMS IPRO6 reticle pattern placement metrology system and the K-T Analyzer 9.0 ...
Finanznachrichten

EUV Mask Blanks Market Size to Reach USD 1.36 Billion by 2031, Driven by Advanced Semiconductor Lithography | Valuates Reports

What is the Market Size of EUV Mask Blanks? BANGALORE, India, Dec. 18, 2025 /PRNewswire/ -- The global market for EUV Mask Blanks was valued at USD 591 Million in the year 2024 and is projected to ...